Double Patterning to the rescue (LELE, LFLE, SADP) - Part 1

Introduction to Double Patterning which is used extensively for printing transistors and other features in front end of line (FEOL) flow in a semiconductor chip.

This video also introduces the various processing options to achieve double patterning i.e.
1. Litho Etch Litho Etch (LELE)
2. Litho Freeze Litho Etch (LFLE)
3. Self Aligned Double Patterning (SADP)

Видео Double Patterning to the rescue (LELE, LFLE, SADP) - Part 1 канала nanolearning