China Tests Its Own EUV Machine — A Direct Challenge to ASML

China has reportedly started testing its own prototype machine for extreme ultraviolet lithography, or EUV — one of the most important technologies for producing advanced semiconductors.

According to Reuters, the prototype was built in a high-security lab in Shenzhen and is now undergoing testing. EUV lithography is critical for manufacturing cutting-edge chips used in artificial intelligence, smartphones and advanced computing. Until now, this market has been dominated by ASML, the Dutch company whose machines are essential for the most advanced chip production.

The Chinese prototype is still far from a commercial ASML-level system. Reports say it is large, complex and still faces serious challenges with precision optics, stability, resolution and contamination control. But the fact that it can generate EUV light and is already being tested is a major signal in the global semiconductor race.

Huawei is reportedly one of the key players behind China’s push to build a domestic AI chip supply chain, from materials and wafer equipment to chip design and manufacturing. The long-term goal is to reduce dependence on foreign technology and move toward advanced domestic chip production.

China reportedly wants to produce working chips with this EUV prototype by 2028, although some experts believe 2030 may be more realistic.

This is Xenon Lab News — semiconductors, AI hardware, chip manufacturing and future technology in one place.

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