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VPD ICP-MS series, part 2: How is the incredible sensitivity possible?

With VPD ICP-MS, we can measure surface concentration down to an astonishing ten to the power six to ten to the power ten atoms per centimeter square. 

And how is this possible? It is due to the concentration effect of that scanning droplet, which is something that makes VPD quite unique.

If you would measure the surface directly, the signal would be weak. But by chemically sweeping the full three hundred millimeter wafer and concentrating all those dispersed atoms into one single microliter droplet, we effectively amplify the signal, achieving ultra trace sensitivity that direct surface measurement tools simply cannot match.

#semiconductor #semiconductormanufacturing #semiconductortesting #thinfilm #wafertesting

Видео VPD ICP-MS series, part 2: How is the incredible sensitivity possible? канала Measurlabs
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