Imaging Multiple Sites with one Reference using the CorrMeas Microscopy Automation Software

When you do quality checks by Scanning Electron Microscopy on wafers, one often wants to image multiple locations which are close to one reference position. Whereas a stage movement always causes a certain positioning error, moving to different locations using the beam shift can be more or less treated as being exact. The newest CorrMeas version makes it now easier to correct the stage positioning error at one reference position and then from there image multiple locations within the beam shift range. This has always been possible to do, but now it can be done much easier due to improvements of CorrMeas' state recorder.

For more information, please visit the CorrMeas web site www.corrmeas.com.

Видео Imaging Multiple Sites with one Reference using the CorrMeas Microscopy Automation Software канала Frank Hitzel